Configurable Compliant Substrates for SiGe Nanomembrane Fabrication - Sorbonne Université
Article Dans Une Revue Crystal Growth & Design Année : 2015

Configurable Compliant Substrates for SiGe Nanomembrane Fabrication

Résumé

Strain-engineered SiGe epitaxial nanomembranes are shown to act as compliant substrates. Fully planar, thick and dislocation-free SiGe films are produced in (pSi substrate/Si buffer/SiGe film) systems. They are shown to be mainly ruled by the softness and tensile strain of pSi and by the elastic interactions regulated by the film and buffer thickness.
Fichier non déposé

Dates et versions

hal-01473070 , version 1 (21-02-2017)

Identifiants

Citer

Jean-Noël Aqua, Luc Favre, Antoine Ronda, Abdelmalek Benkouider, Isabelle Berbezier. Configurable Compliant Substrates for SiGe Nanomembrane Fabrication. Crystal Growth & Design, 2015, 15 (7), pp.3399 - 3406. ⟨10.1021/acs.cgd.5b00485⟩. ⟨hal-01473070⟩
193 Consultations
0 Téléchargements

Altmetric

Partager

More