Configurable Compliant Substrates for SiGe Nanomembrane Fabrication
Abstract
Strain-engineered SiGe epitaxial nanomembranes are shown to act as compliant substrates. Fully planar, thick and dislocation-free SiGe films are produced in (pSi substrate/Si buffer/SiGe film) systems. They are shown to be mainly ruled by the softness and tensile strain of pSi and by the elastic interactions regulated by the film and buffer thickness.