This work examines the growth dynamics of TiO2-SiO2 nanocomposite coatings in plane-to-plane Dielectric Barrier Discharges (DBDs) at atmospheric pressure operated in a Townsend regime using nebulized TiO2 colloidal suspension in hexamethyldisiloxane as the growth precursors. For low-frequency (LF) sinusoidal voltages applied to the DBD cell, with voltage amplitudes lower than the one required for discharge breakdown, Scanning Electron Microscopy of silicon substrates placed on the bottom DBD electrode reveals significant deposition of TiO2 nanoparticles (NPs) close to the discharge entrance. On the other hand, at higher frequencies (HF), the number of TiO2 NPs deposited strongly decreases due to their “trapping” in the oscillating voltage and their transport along the gas flow lines. Based on these findings, a combined LF-HF voltage waveform is proposed and used to achieve significant and spatially uniform deposition of TiO2 NPs across the whole substrate surface. For higher voltage amplitudes, in the presence of hexamethyldisiloxane and nitrous oxide for plasma-enhanced chemical vapor deposition of inorganic layers, it is found that TiO2 NPs become fully embedded into a silica-like matrix. Similar Raman spectra are obtained for as-prepared TiO2 NPs and for nanocomposite TiO2-SiO2 coating, suggesting that plasma exposure does not significantly alter the crystalline structure of the TiO2 NPs injected into the discharge.