Direct Low-Temperature Deposition of Crystallized CoOOH Films by Potentiostatic Electrolysis. - Sorbonne Université Access content directly
Journal Articles Journal of The Electrochemical Society Year : 2005

Direct Low-Temperature Deposition of Crystallized CoOOH Films by Potentiostatic Electrolysis.

Abstract

Cobalt oxide films were deposited onto nickel electrodes from 25 up to 90°C at a constant potential of 0.5 V vs. SCE from a pH 7.4 nitrate solution containing Co(II). Above 60°C, scanning electron microscopy and X-ray diffraction (XRD) experiments reveal that the films are constituted of crystallized grains. At 90°C the crystallite size is measured at ca. 34 nm. XRD experiments show that the crystallized product is composed of CoOOH, and Raman spectroscopy shows the formation of this compound between 40 and 90°C. Between room temperature and 90°C, the deposition rate is increased by an order of magnitude and the deposit crystallization has a favorable effect on the faradaic deposition efficiency. It may also favor the mechanical stability in temperature of this deposit when used as cobalt oxide-based protective coating of the molten carbonate fuel cell nickel cathode.
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Dates and versions

hal-04175290 , version 1 (02-08-2023)

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T. Pauporté, L. Mendoza, M. Cassir, Marie Claude Bernard, J. Chivot. Direct Low-Temperature Deposition of Crystallized CoOOH Films by Potentiostatic Electrolysis.. Journal of The Electrochemical Society, 2005, 152 (2), pp.C49. ⟨10.1149/1.1842044⟩. ⟨hal-04175290⟩
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