Andrea Cattoni, Dominique Mailly, Olivier Dalstein, Marco Faustini, Gediminas Seniutinas, et al.. Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist.
Microelectronic Engineering, Elsevier, 2018, 193, pp.18-22.
⟨10.1016/j.mee.2018.02.015⟩.
⟨hal-01723319⟩