Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O<sub>2</sub>post-discharge - Sorbonne Université Access content directly
Journal Articles Journal of Physics D: Applied Physics Year : 2013

Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O2post-discharge

Thierry Dufour
J Hubert
  • Function : Author
N Vandencasteele
  • Function : Author
P Viville
  • Function : Author
R Lazzaroni
  • Function : Author
F Reniers
  • Function : Author

Abstract

Among various surface modification techniques, plasma can be used as a source for tailoring the surface properties of diverse materials. HDPE and fluoropolymer surfaces have been treated by the post-discharge of an atmospheric RFplasma torch supplied with helium and oxygen gases. The plasma-treated surfaces were characterized by measurements of mass losses, water contact angles, x-ray photoelectron spectroscopy and atomic force microscopy. This experimental approach correlated with an optical characterization of the plasma phase allowed us to propose etching mechanisms occurring at the post-discharge/polymer interface. We discuss how competitive and synergistic effects can result from the oxidation and/or the roughening of the surface but also from the excimer VUV radiation, the He metastable species and the O radicals reaching the plasma-polymer interface.
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hal-03968657 , version 1 (01-02-2023)

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Thierry Dufour, J Hubert, N Vandencasteele, P Viville, R Lazzaroni, et al.. Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O2post-discharge. Journal of Physics D: Applied Physics, 2013, 46, ⟨10.1088/0022-3727/46/31/315203⟩. ⟨hal-03968657⟩
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