NANOIMPRINT LITHOGRAPHY PROCESS AND PATTERNED SUBSTRATE OBTAINABLE THEREFROM - Sorbonne Université Access content directly
Patents Year : 2017

NANOIMPRINT LITHOGRAPHY PROCESS AND PATTERNED SUBSTRATE OBTAINABLE THEREFROM

Abstract

The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for providing a sol-gel patterned layer on a substrate. Specifically, this process comprises a step of adjusting the solvent uptake of the sol- gel film to 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mould is applied onto the substrate coated with the sol-gel film.
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Dates and versions

hal-03996259 , version 1 (19-02-2023)

Identifiers

  • HAL Id : hal-03996259 , version 1

Cite

David Grosso, Marco Faustini, Olivier Dalstein, Andrea Cattoni, Thomas Bottein. NANOIMPRINT LITHOGRAPHY PROCESS AND PATTERNED SUBSTRATE OBTAINABLE THEREFROM. France, Patent n° : US2020218147. 2017. ⟨hal-03996259⟩
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