N-doped TiO2 thin films have been prepared by reactive RF magnetron sputtering at different pressures and with different compositions using a dual reactive gas mixture of nitrogen and oxygen. The morphological, optical, photo-electrochemical and photocatalytic properties have been studied in order to investigate the white light and visible light photoactivities of the films. Significant control over the band gap energy in the films was achieved by varying the deposition parameters. Photoelectrochemical characterization revealed improved white light photocurrent generation in nitrogen doped films prepared at low pressures. However, the visible light photocurrent generation showed improvement for all deposition pressures, and changed accordingly with the nitrogen incorporation. Photocatalytic measurements of a common chemical pollutant NMP (N-methyl-2-pyrrolidone) under different irradiation conditions provided evidence of improved photoactivity for samples prepared at high pressure, due to the increased active surface area and optimal nitrogen doping levels. Overall, this study showed a simple method to produce highly controllable nitrogen doping in different sites within TiO2 showing improved visible light photoactivity and photo induced pollutant degradation. More interestingly, by investigating the effect of different nitrogen sites in nitrogen doped TiO2, we have shown that the optimized conditions for photocatalysis do not correspond to those for water splitting.