This chapter focuses on chemical liquid deposition methods that involve controlled covering of surfaces with a chemical liquid solution, the sol-gel solution, of known composition. The techniques include dip coating, spin coating, roll-to-roll coating, droplet-assisted deposition and electro-assisted deposition. The chapter presents briefly the different steps involved in the process of thin film formation that are common to all techniques. To have a better understanding, all available liquid deposition techniques are usually described with an identical sequence of successive steps: initial chemical solution formulation, solution spreading on the surface of the substrate, evaporation of the liquid solution layer, layer post-processing, and final treatment of the layer for stabilization. These steps can be addressed individually because they are separated in time. Important progress made in the past few decades highlights the importance of the evaporation conditions in controlling the structure of the coating, which is better achieved in dip coating.