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Journal Articles Crystal Growth & Design Year : 2015

Configurable Compliant Substrates for SiGe Nanomembrane Fabrication

Abstract

Strain-engineered SiGe epitaxial nanomembranes are shown to act as compliant substrates. Fully planar, thick and dislocation-free SiGe films are produced in (pSi substrate/Si buffer/SiGe film) systems. They are shown to be mainly ruled by the softness and tensile strain of pSi and by the elastic interactions regulated by the film and buffer thickness.
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hal-01473070 , version 1 (21-02-2017)

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Jean-Noël Aqua, Luc Favre, Antoine Ronda, Abdelmalek Benkouider, Isabelle Berbezier. Configurable Compliant Substrates for SiGe Nanomembrane Fabrication. Crystal Growth & Design, 2015, 15 (7), pp.3399 - 3406. ⟨10.1021/acs.cgd.5b00485⟩. ⟨hal-01473070⟩
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