Fabrication and optimization of planar defects embedded between two silica opals - Sorbonne Université
Communication Dans Un Congrès Année : 2015

Fabrication and optimization of planar defects embedded between two silica opals

Résumé

We present a versatile and efficient way to engineer a planar defect layer between two opal-based photonic crystals, leading to the appearance of a passband within the photonic stopband. The optimization of the planar defect parameters, necessary to preserve the high crystallographic order of the hetero-structures, is deduced from 1D-simulations of reflection spectra.
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Dates et versions

hal-01477412 , version 1 (27-02-2017)

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C. Bourdillon, Phan Ngoc Hong, S. Gam-Derouich, P. Bénalloul, Laurent Coolen, et al.. Fabrication and optimization of planar defects embedded between two silica opals. 17th International Conference on Transparent Optical Networks (ICTON), Jul 2015, Budapest, Hungary. ⟨10.1109/ICTON.2015.7193327⟩. ⟨hal-01477412⟩
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