Water-rich conditions during titania atomic layer deposition in the 100 °C-300 °C temperature window produce films with TiIV oxidation state but large H and O content variations - Sorbonne Université Access content directly
Journal Articles Applied Surface Science Year : 2022

Water-rich conditions during titania atomic layer deposition in the 100 °C-300 °C temperature window produce films with TiIV oxidation state but large H and O content variations

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hal-03907172 , version 1 (01-02-2023)

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Bingbing Xia, Jean-Jacques Ganem, Ian Vickridge, Emrick Briand, Sébastien Steydli, et al.. Water-rich conditions during titania atomic layer deposition in the 100 °C-300 °C temperature window produce films with TiIV oxidation state but large H and O content variations. Applied Surface Science, 2022, 601, pp.154233. ⟨10.1016/j.apsusc.2022.154233⟩. ⟨hal-03907172⟩
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