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Journal Articles Surface and Interface Analysis Year : 2006

Correlation between electrochemical reactivity and surface chemistry of amorphous carbon nitride films

Abstract

Amorphous carbon nitride (a-CNx) films prepared by RF magnetron sputtering technique display a moderate electrochemical reactivity. However, after electrochemical activation by a cathodic pretreatment in acidic solution, they exhibit a quasimetallic behavior. This behavior has been notably assessed by scanning electrochemical microscopy (SECM). The approach curves show that the a-CNx electrode surfaces are made of active and inactive domains. These surfaces have also been characterized by atomic force microscopy (AFM) and XPS. AFM shows that the a-CNx surface roughness remains very low after the activation treatment. XPS analyses indicate that the electrochemical activation of the a-CNx materials is associated with a decrease in the number of superficial nitrogen atoms involved in sp3 CN bonds. Copyright © 2006 John Wiley & Sons, Ltd.

Dates and versions

hal-04166106 , version 1 (19-07-2023)

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Hubert Cachet, Catherine Debiemme-Chouvy, Claude Deslouis, A. Lagrini, Vincent Vivier. Correlation between electrochemical reactivity and surface chemistry of amorphous carbon nitride films. Surface and Interface Analysis, 2006, 38 (4), pp.719-722. ⟨10.1002/sia.2146⟩. ⟨hal-04166106⟩
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