The analysis of the relationship between the local microstructure evolution versus nitrogen content and electrical properties of amorphous carbon nitride films (a-CNx) deposited by radio frequency (RF) magnetron sputtering is reported. Combined TRIM code, XPS measurements and Raman scattering spectroscopy are used to investigate the microstructure of a-CNx, films, in their as-deposited state, in terms of surface processes, nitrogen incorporation within the films and the Csp2 content. These experiments were completed by dark electrical conductivity measurements performed at room temperature in coplanar configuration. A good correlation is observed between the local microstructure and the conductivity at different amounts of nitrogen.