Electrochemical Characterization of the Open-Circuit Deposition of Platinum on Silicon from Fluoride Solutions - Sorbonne Université Access content directly
Journal Articles Journal of Physical Chemistry B Year : 2003

Electrochemical Characterization of the Open-Circuit Deposition of Platinum on Silicon from Fluoride Solutions

Abstract

An electrochemical study of the open-circuit deposition of platinum on silicon from fluoride solutions is presented. The main features of the process can be explained using the mixed potential theory, in which the electrode potential is defined by two simultaneous reactions at the electrode surface:  a cathodic reaction (platinum reduction and deposition) and an anodic reaction (silicon oxidation and dissolution). The charge is exchanged through the semiconducting substrate.

Dates and versions

hal-04212615 , version 1 (20-09-2023)

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Pau Gorostiza, Philippe Allongue, Raül Díaz, Joan Ramon Morante, Fausto Sanz. Electrochemical Characterization of the Open-Circuit Deposition of Platinum on Silicon from Fluoride Solutions. Journal of Physical Chemistry B, 2003, 107 (26), pp.6454-6461. ⟨10.1021/jp030071v⟩. ⟨hal-04212615⟩
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