Electrochemical Characterization of the Open-Circuit Deposition of Platinum on Silicon from Fluoride Solutions
Abstract
An electrochemical study of the open-circuit deposition of platinum on silicon from fluoride solutions is presented. The main features of the process can be explained using the mixed potential theory, in which the electrode potential is defined by two simultaneous reactions at the electrode surface: a cathodic reaction (platinum reduction and deposition) and an anodic reaction (silicon oxidation and dissolution). The charge is exchanged through the semiconducting substrate.