The Mechanism of the Anodic Oxidation of Silicon in Acidic Fluoride Solutions Revisited - Sorbonne Université Access content directly
Journal Articles Berichte der Bunsengesellschaft für physikalische Chemie Year : 1993

The Mechanism of the Anodic Oxidation of Silicon in Acidic Fluoride Solutions Revisited

Abstract

The present experience of the electrochemical dissolution of silicon and previous assumptions upon the mechanism are briefly reviewed. A new model is developed which explains how the coverage of the surface by hydrogen can be maintained in spite of the continuous anodic dissolution.

Dates and versions

hal-04523076 , version 1 (27-03-2024)

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H. Gerischer, Philippe Allongue, V. Costa Kieling. The Mechanism of the Anodic Oxidation of Silicon in Acidic Fluoride Solutions Revisited. Berichte der Bunsengesellschaft für physikalische Chemie, 1993, 97 (6), pp.753-757. ⟨10.1002/bbpc.19930970602⟩. ⟨hal-04523076⟩
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